CVD Equipment Corporation (NASDAQ:CVV – Get Free Report) was the recipient of a large increase in short interest in the month of March. As of March 31st, there was short interest totaling 42,148 shares, an increase of 67.2% from the March 15th total of 25,201 shares. Based on an average daily volume of 991,219 shares, the short-interest ratio is presently 0.0 days. Approximately 0.9% of the company’s shares are sold short.
Hedge Funds Weigh In On CVD Equipment
Several hedge funds and other institutional investors have recently added to or reduced their stakes in the business. Dimensional Fund Advisors LP boosted its stake in CVD Equipment by 5.2% during the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after purchasing an additional 3,556 shares during the last quarter. Citadel Advisors LLC raised its stake in shares of CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after purchasing an additional 20,011 shares during the last quarter. Finally, DRW Securities LLC purchased a new position in shares of CVD Equipment in the fourth quarter worth $45,000. 31.59% of the stock is owned by institutional investors.
CVD Equipment Stock Up 1.4%
CVD Equipment stock traded up $0.06 during trading hours on Tuesday, hitting $4.25. The stock had a trading volume of 4,272 shares, compared to its average volume of 240,308. The stock’s 50-day moving average price is $4.09 and its 200-day moving average price is $3.84. The stock has a market capitalization of $29.49 million, a P/E ratio of -19.14 and a beta of 0.95. CVD Equipment has a 12-month low of $2.46 and a 12-month high of $6.25.
Wall Street Analyst Weigh In
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CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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