CVD Equipment (NASDAQ:CVV) Stock Price Passes Above Two Hundred Day Moving Average – What’s Next?

CVD Equipment Corporation (NASDAQ:CVV)’s stock price crossed above its 200-day moving average during trading on Tuesday . The stock has a 200-day moving average of $4.16 and traded as high as $7.40. CVD Equipment shares last traded at $7.01, with a volume of 172,420 shares.

Wall Street Analyst Weigh In

CVV has been the subject of several analyst reports. Weiss Ratings reaffirmed a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. Wall Street Zen lowered CVD Equipment from a “hold” rating to a “sell” rating in a research report on Saturday, April 4th. One investment analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the stock has a consensus rating of “Sell”.

CVD Equipment Trading Down 5.5%

The stock has a market cap of $48.65 million, a P/E ratio of -31.86 and a beta of 1.35. The business has a 50-day simple moving average of $4.87 and a 200 day simple moving average of $4.16.

Institutional Inflows and Outflows

A number of hedge funds and other institutional investors have recently made changes to their positions in CVV. Dimensional Fund Advisors LP lifted its stake in shares of CVD Equipment by 5.2% in the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after purchasing an additional 3,556 shares during the period. Citadel Advisors LLC raised its stake in shares of CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after purchasing an additional 20,011 shares during the last quarter. Finally, DRW Securities LLC purchased a new stake in shares of CVD Equipment in the fourth quarter worth approximately $45,000. 31.59% of the stock is owned by institutional investors and hedge funds.

CVD Equipment Company Profile

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.